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Solar Silicon Wafer Cleaning Agent For Removing Glue

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Mr. Jesse Tang

hongshunautomation@gmail.com

8613929185382

8613929185382

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Solar Silicon Wafer Cleaning Agent For Removing Glue

Brand Name:	Hongshun
Model Number:	HS-25SS
MOQ:	10 barrels
Price:	$20-$30/barrel
Packaging Details:	barrel
Payment Terms:	L/C,T/T

Detail Information

Product Description

Detail Information

Place of Origin:

Dongguan

Certification:

ISO9001

Appearance:

Colourless To Slightly Yellow Liquid

Density:

1.10-1.2g/L

13 - 14

Safety:

Non-flammable, Non-corrosive

Packaging:

25Kg Per Barrel

Supply Ability:

500 buckets/month

Highlight:

solar silicon wafer cleaning agent

glue removal cleaning solution

solar wafer adhesive remover

Product Description

Solar Silicon Wafer Cleaning Agent For Removing Glue

This specialized solar silicon wafer cleaning agent is engineered specifically for electronic-grade and solar-grade silicon wafers in IT and solar cell applications. As a single-component solution, it delivers exceptional performance in emulsifying, saponifying, and cleaning various oil stains including animal, vegetable, and mineral oils, as well as suspensions and grinding pastes. The product features strong stripping, complexation, and cleaning capabilities for metal ions while maintaining excellent environmental compatibility and powerful cleaning efficiency.

Product Advantages

Specifically formulated for silicon wafer materials with high cleanliness standards
Low foam characteristics suitable for high-precision IT requirements
Excellent cleaning performance with no residue and no impact on conductivity
Fast cleaning speed with non-corrosive properties and easy rinsing
Environmentally friendly, odorless, and non-irritating to skin
Low odor, non-toxic, no flash point, non-flammable and non-explosive
Free from metal ions and phosphorus, compliant with EU RoHS certification

Technical Specifications

Appearance	Colorless to slightly yellow liquid
Density	1.10-1.2g/L
pH (working solution)	13 - 14
Safety	Non-flammable, non-corrosive
Environmental Compliance	Phosphorus-free, halogen-free, complies with EU RoHS requirements

Process Flow Diagram

Usage Instructions

Fill the cleaning tank with 3/4 pure water, then add the cleaning agent at a concentration of 3-5%, and complete filling with pure water to the operating level. Heat the solution to the required temperature range of 50-65℃. Processing time: 2-5 minutes.

Application Fields

Primarily used for post-cutting cleaning of silicon wafers for solar cells, as well as cleaning after the cutting of semiconductor chips and wafers.

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Address

Building 1, No. 13, Sanheng Road, Lianhu South, Tangxia Town, Dongguan City

Tel

86--13929185382

E-mail

hongshunautomation@gmail.com

8613929185382

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